Xiaofan Meng has been a member of the cryoelectronics group since 1991. Before joining the group, he was Associate Professor at Physics Department of Peking University and Visiting Professor at University of Virginia. Currently he is in charge of niobium superconductive integrated circuit process line. His major research project is to develop a new process for niobium integrated circuit fabrication which include precise sheet resistivity control, tunnel current density premeasurement, low temperature ECR PECVD silicon oxide dielectric layers etc. He is also interested in high temperature superconducting device and electro-optic device fabrication.